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Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection

 a,  a,  a,  b,  c,  a,  c,  a,  a,  c,  a,  d,  a,  a,  d,  b,  a,  a,  a,  a,  c,  e, f,  c,  f,  b
a Institute of Spectroscopy, Russian Academy of Sciences, ul. Fizicheskaya 5, Troitsk, Moscow, 108840, Russian Federation
b EUV Labs, Ltd., Sirenevy bulvar 1, Troitsk, Moscow, 142191, Russian Federation
c M.V. Keldysh Institute of Applied Mathematics, Russian Academy of Sciences, Miusskaya pl. 4, Moscow, 125047, Russian Federation
d Moscow Institute of Physics and Technology (National Research University), Institutskii per. 9, Dolgoprudny, Moscow Region, 141701, Russian Federation
e Prokhorov General Physics Institute of the Russian Academy of Sciences, ul. Vavilova 38, Moscow, 119991, Russian Federation
f Lebedev Physical Institute, Russian Academy of Sciences, Leninsky prosp. 53, Moscow, 119991, Russian Federation

We report on the development of plasma-based sources of extreme ultraviolet radiation for the next generation lithography and mask inspection and the development of equipment for spectral diagnostics of such sources.

Fulltext pdf (913 KB)
Fulltext is also available at DOI: 10.3367/UFNe.2018.06.038447
Keywords: EUV lithography, laser-produced plasma, radiation sources
PACS: 42.82.Cr, 52.25.Os, 52.59.−f, 52.70.−m, 52.77.−j (all)
DOI: 10.3367/UFNe.2018.06.038447
URL: https://ufn.ru/en/articles/2019/3/j/
000469214700010
2-s2.0-85070730766
2019PhyU...62..304A
Citation: Abramenko D B, Antsiferov P S, Astakhov D I, Vinokhodov A Yu, Vichev I Yu, Gayazov R R, Grushin A S, Dorokhin L A, Ivanov V V, Kim D A, Koshelev K N, Krainov P V, Krivokorytov M S, Krivtsun V M, Lakatosh B V, Lash A A, Medvedev V V, Ryabtsev A N, Sidel’nikov Yu V, Snegirev E P, Solomyannaya A D, Spiridonov M V, Tsygvintsev I P, Yakushev O F, Yakushkin A A "Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection" Phys. Usp. 62 304–314 (2019)
BibTexBibNote ® (generic)BibNote ® (RIS)MedlineRefWorks

Received: 28th, August 2018, 20th, June 2018

Оригинал: Абраменко Д Б, Анциферов П С, Астахов Д И, Виноходов А Ю, Вичев И Ю, Гаязов Р Р, Грушин А С, Дорохин Л А, Иванов В В, Ким Д А, Кошелев К Н, Крайнов П В, Кривокорытов М С, Кривцун В М, Лакатош Б В, Лаш А А, Медведев В В, Рябцев А Н, Сидельников Ю В, Снегирёв Е П, Соломянная А Д, Спиридонов М В, Цыгвинцев И П, Якушев О Ф, Якушкин А А «Плазменные источники экстремального ультрафиолетового излучения для литографии и сопутствующих технологических процессов (к 50-летию Института спектроскопии РАН)» УФН 189 323–334 (2019); DOI: 10.3367/UFNr.2018.06.038447

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