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Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection

 a,  a,  a,  b,  c,  a,  c,  a,  a,  c,  a,  d,  a,  a,  d,  b,  a,  a,  a,  a,  c,  e, f,  c,  f,  b
a Institute of Spectroscopy, Russian Academy of Sciences, ul. Fizicheskaya 5, Troitsk, Moscow, 108840, Russian Federation
b EUV Labs, Ltd., Sirenevy bulvar 1, Troitsk, Moscow, 142191, Russian Federation
c M.V. Keldysh Institute of Applied Mathematics, Russian Academy of Sciences, Miusskaya pl. 4, Moscow, 125047, Russian Federation
d Moscow Institute of Physics and Technology (National Research University), Institutskii per. 9, Dolgoprudny, Moscow Region, 141700, Russian Federation
e Prokhorov General Physics Institute of the Russian Academy of Sciences, ul. Vavilova 38, Moscow, 119991, Russian Federation
f Lebedev Physical Institute, Russian Academy of Sciences, Leninsky prosp. 53, Moscow, 119991, Russian Federation

We report on the development of plasma-based sources of extreme ultraviolet radiation for the next generation lithography and mask inspection and the development of equipment for spectral diagnostics of such sources.

Fulltext pdf (913 KB)
Fulltext is also available at DOI: 10.3367/UFNe.2018.06.038447
Keywords: EUV lithography, laser-produced plasma, radiation sources
PACS: 42.82.Cr, 52.25.Os, 52.59.−f, 52.70.−m, 52.77.−j (all)
DOI: 10.3367/UFNe.2018.06.038447
URL: https://ufn.ru/en/articles/2019/3/j/
000469214700010
2-s2.0-85070730766
2019PhyU...62..304A
Citation: Abramenko D B, Antsiferov P S, Astakhov D I, Vinokhodov A Yu, Vichev I Yu, Gayazov R R, Grushin A S, Dorokhin L A, Ivanov V V, Kim D A, Koshelev K N, Krainov P V, Krivokorytov M S, Krivtsun V M, Lakatosh B V, Lash A A, Medvedev V V, Ryabtsev A N, Sidel’nikov Yu V, Snegirev E P, Solomyannaya A D, Spiridonov M V, Tsygvintsev I P, Yakushev O F, Yakushkin A A "Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection" Phys. Usp. 62 304–314 (2019)
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Received: 28th, August 2018, 20th, June 2018

Оригинал: Абраменко Д Б, Анциферов П С, Астахов Д И, Виноходов А Ю, Вичев И Ю, Гаязов Р Р, Грушин А С, Дорохин Л А, Иванов В В, Ким Д А, Кошелев К Н, Крайнов П В, Кривокорытов М С, Кривцун В М, Лакатош Б В, Лаш А А, Медведев В В, Рябцев А Н, Сидельников Ю В, Снегирёв Е П, Соломянная А Д, Спиридонов М В, Цыгвинцев И П, Якушев О Ф, Якушкин А А «Плазменные источники экстремального ультрафиолетового излучения для литографии и сопутствующих технологических процессов (к 50-летию Института спектроскопии РАН)» УФН 189 323–334 (2019); DOI: 10.3367/UFNr.2018.06.038447

References (71) ↓ Cited by (26) Similar articles (20)

  1. Wagner C, Harned N Nature Photon. 4 24 (2010)
  2. Moors R J. Micro Nanolithogr. MEMS MOEMS 11 021102 (2012)
  3. Hosler E R, Wood O R X-Ray Lasers 2016, Proc. of the 15th Intern. Conf. on X-Ray Lasers (Eds T Kawachi, S V Bulanov, H Daido, Y Kato) (Cham: Springer, 2018) p. 351
  4. Fujimoto J J. Micro Nanolithogr. MEMS MOEMS 11 021111 (2012)
  5. Fomenkov I V J. Micro Nanolithogr. MEMS MOEMS 11 021110 (2012)
  6. Fomenkov I Adv. Opt. Technol. 6 173 (2017)
  7. Jin F, Richardson M Appl. Opt. 34 5750 (1995)
  8. Klosner M A Opt. Lett. 22 34 (1997)
  9. Klosner M A, Silfvast W T Opt. Lett. 23 1609 (1998)
  10. Koshelev K SeMaTech EUV Source Workshop, 2002
  11. Churilov S, Ryabtsev A Phys. Scripta 73 614 (2006)
  12. Chурch’?’?’?’? ’l ’l, ’iya’?ts’?’? ’B ’v ’d’?т’?’?’? с’?’?’?тр’?с’?’?’?’?ya 101 181 (2006); Churilov S, Ryabtsev A Opt. Spectrosc. 101 169 (2006)
  13. Louis E Prog. Surf. Sci. 86 255 (2011)
  14. Banine V Y, Koshelev K N, Swinkels G H P M J. Phys. D 44 253001 (2011)
  15. Schriever G t al. J. Micro Nanolithogr. MEMS MOEMS 11 021104 (2012)
  16. ’F’?sh’?’?’?’? ’F ’i, ’G’?’?’?’? ’E ’M, ’l’?’?’?shch’?’?’?’? ’v ’v Usp. Fiz. Nauk 177 777 (2007); Koshelev K N, Banine V E, Salashchenko N N Phys. Usp. 50 741 (2007)
  17. Wagenaars E ey al. Appl. Phys. Lett. 92 181501 (2008)
  18. Koshelev K J. Micro Nanolithogr. MEMS MOEMS 11 021103 (2012)
  19. Fomenkov I V EUV Lithography (Ed. V Bakshi) (Bellingham, WA: SPIE Press) 3 (2018)
  20. Feldmann H, Ruoff J, Dinger U 2014 Intern. Workshop on EUV and Soft X-Ray Sources, November 3 - 6, 2014, Dublin, Ireland
  21. Vinokhodov A Rev. Sci. Instrum. 87 103304 (2016)
  22. ’v’?’?’?ф’?р’?’? ’B ’s, ’v’?’?’?’?’?’? ’E ’I, ’p’?’?р’?’? ’E ’G ’F’?’?’?т’?’?’?-ст’?т’?ст’?ch’?с’?’?’? ’?’?’?’?’?’? ’?ыс’?’?’?т’?’?’?’?р’?тур’?’?’? ’?’?’?’?’?ы. ’a’?т’?’?ы р’?сch’?т’? р’?сс’?’?’?’?’?’?’?ыkh ’?р’?’?’?’?’?’? ’? ур’?’?’?’?’?’?’? с’?ст’?ya’?’?ya (’a.: ’s’?’?’?’?т’?’?т, 2000); ’z’?р. ’?’? ’?’?’?’?. ya’?., Nikiforov A F, Novikov V G, Uvarov V B Quantum-Statistical Models Of Hot Dense Matter. Methods For Computation Opacity And Equation Of State ((Basel: Birkhäuser Verlag, 2005)
  23. THERMOS — ’?’?’?’?’?’?’?с ’?р’?’?р’?’?’? ’? ’?’?’?’? ’?т’?’?’?ыkh ’?’?’?’?ыkh, http://www.keldysh.ru/thermos
  24. Novikov V G Modern Methods In Collisional-Radiative Modeling Of Plasmas (Springer Series on Atomic, Optical, and Plasma Physics) Vol. 90 (Ed. Yu Ralchenko) (Cham: Springer, 2016) p. 105
  25. Abdallah J, Sherrill M E High Energy Density Phys. 4 124 (2008)
  26. Cowan R D The Theory Of Atomic Structure And Spectra (Berkeley, CA: Univ. of California Press, 1981)
  27. Gu M F Can. J. Phys. 86 675 (2008)
  28. Tolstikhina I EUV Sources For Lithography (Ed. V Bakshi) (Bellingham, WA: SPIE Press, 2006) p. 113
  29. Lotz W Z. Phys. 206 205 (1967)
  30. Lotz W Z. Phys. 216 241 (1968)
  31. Lotz W Z. Phys. A 220 466 (1969)
  32. Lotz W Z. Phys. A 232 101 (1970)
  33. Regemorter H V Astrophys. J. 136 906 (1962)
  34. Kramers H London Edinburgh Dublin Philos. Mag. J. Sci. 46 836 (1923)
  35. Zh’?’?’?’?’? ’E ’z Zh. Eksp. Teor. Fiz. 75 1214 (1978); Zhdanov V P Sov. JETP 48 611 (1978)
  36. Basko M M Phys. Plasmas 23 083114 (2016)
  37. ’v’?’?’?’?’?’? ’E ’I, ’l’?’?’?’?ya’?’?’?ya ’B ’K Teplofiz. Vys. Temp. 36 858 (1998); Novikov V G, Solomyannaya A D High Temp. 36 835 (1998)
  38. Novikov V G, Zakharov S V J. Quant. Spectrosc. Radiat. Transf. 81 339 (2003)
  39. Novikov V G High Energy Density Phys. 3 198 (2007)
  40. Matsukuma H Appl. Phys. Lett. 107 121103 (2015)
  41. ’E’?’?’?kh’?’?’?’? ’B Yu ’? ’?р Kvantovaya Elektron. 46 23 (2016); Vinokhodov A Yu Quantum Electron. 46 23 (2016)
  42. Krivokorytov M S Phys. Rev. E
  43. Basko M M Laser Phys. Lett. 14 036001 (2017)
  44. Krivokorytov M S Sci. Rep. 8 597 (2018)
  45. Grigoryev S Yu Phys. Rev. Applied 10 064009 (2018)
  46. Basko M M Laser Phys. Lett. 14 036001 (2017)
  47. Kurilovich D Phys. Rev. Appl. 6 014018 (2016)
  48. Kurilovich D Phys. Plasmas 25 012709 (2018)
  49. Reijers S A J. Appl. Phys. 124 013102 (2018)
  50. O’Sullivan G, Kilbane D, D’Arcy R J. Mod. Opt. 59 855 (2012)
  51. Koshelev K J. Micro Nanolithogr. MEMS MOEMS 11 021112 (2012)
  52. Harilal S S, O’Shay B, Tillack M S J. Appl. Phys. 98 036102 (2005)
  53. Ueno Y Appl. Phys. Lett. 92 211503 (2008)
  54. Elg D T J. Micro Nanolithogr. MEMS MOEMS 14 013506 (2015)
  55. Bleiner D, Lippert T J. Appl. Phys. 106 123301 (2009)
  56. Nakamura D J. Appl. Phys. 102 123310 (2007)
  57. Harilal S S Appl. Phys. B 86 547 (2007)
  58. van Herpen M M J W Chem. Phys. Lett. 484 197 (2010)
  59. Abramenko D B Appl. Phys. Lett. 112 164102 (2018)
  60. Astakhov D 2016 Intern. Workshop on EUV and Soft X-Ray Sources, November 7 - 9, 2016, Amsterdam, The Netherlands (Bellingham, WA: SPIE Press, 2016)
  61. Ugur D Chem. Phys. Lett. 552 122 (2012)
  62. Antsiferov P S et al. US Patent US9476841B1 (2016)
  63. Sopkin Yu V Phys. Lett. A 152 215 (1991)
  64. ’B’?ts’?ф’?р’?’? ’z ’l ’? ’?р Prib. Tekh. Eksp. (5) 121 (2015); Antsiferov P S Instrum. Exp. Tech. 58 696 (2015)
  65. Hirata M Rev. Sci. Instrum. 61 2566 (1990)
  66. Kita T Appl. Opt. 22 512 (1983)
  67. ’E’?sh’?ya’?’?’? ’M ’B, Sh’?т’?kh’?’? ’B ’v, ’i’?’?’?’?’?’? ’M ’v Kvantovaya Elektron. 45 371 (2015); Vishnyakov E A, Shatokhin A N, Ragozin E N Quantum Electron. 45 371 (2015)
  68. ’E’?sh’?ya’?’?’? ’M ’B ’? ’?р Kvantovaya Elektron. 46 953 (2016); Vishnyakov E A et al Quantum Electron. 46 953 (2016)
  69. Antsiferov P S, Dorokhin L A, Krainov P V Rev. Sci. Instrum. 87 053106 (2016)
  70. Myers D W et al Proc. SPIE 5751 248 (2005)
  71. Turkot B 2018 EUVL Workshop, June 11 - 14, 2018, Berkeley, CA, USA
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