Dmitrii Andreevich Kim



M.V. Keldysh Institute of Applied Mathematics, Russian Academy of Sciences
Address: Miusskaya pl. 4, Moscow, 125047, Russian Federation


Articles

  1. D.B. Abramenko, P.S. Antsiferov, D.I. Astakhov et alPlasma-based sources of extreme ultraviolet radiation for lithography and mask inspection62 304–314 (2019)

See also: A.D. Solomyannaya, I.Yu. Vichev, A.S. Grushin, I.P. Tsygvintsev, R.R. Gayazov, Yu.V. Sidel’nikov, A.A. Lash, V.V. Medvedev, K.N. Koshelev, A.N. Ryabtsev, A.A. Yakushkin, O.F. Yakushev, M.S. Krivokorytov, P.S. Antsiferov, A.Yu. Vinokhodov

PACS: 52.77.-j, 52.70.-m, 52.59.-f, 52.25.Os, 42.82.Cr,

© 1918–2019 Uspekhi Fizicheskikh Nauk
Email: ufn@ufn.ru Editorial office contacts About the journal Terms and conditions