Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection

D.B. Abramenko^a, P.S. Antsiferov^a, D.I. Astakhov^a, A.Yu. Vinokhodov^b, I.Yu. Vichev^c, R.R. Gayazov^a, A.S. Grushin^c, L.A. Dorokhin^a, V.V. Ivanov^a, D.A. Kim^c, K.N. Koshelev^a, P.V. Krainov^d, M.S. Krivokorytov^a, V.M. Krivtsun^a, B.V. Lakatosh^d, A.A. Lash^b, V.V. Medvedev^a, A.N. Ryabtsev^a, Yu.V. Sidel’nikov^a, E.P. Snegirev^a, A.D. Solomyannaya^c, M.V. Spiridonov^e, f, I.P. Tsygvintsev^c, O.F. Yakushev^f, A.A. Yakushkin^b
^aInstitute of Spectroscopy, Russian Academy of Sciences, ul. Fizicheskaya 5, Troitsk, Moscow, 108840, Russian Federation
^bEUV Labs, Ltd., Sirenevy bulvar 1, Troitsk, Moscow, 142191, Russian Federation
^cM.V. Keldysh Institute of Applied Mathematics, Russian Academy of Sciences, Miusskaya pl. 4, Moscow, 125047, Russian Federation
^dMoscow Institute of Physics and Technology (National Research University), Institutskii per. 9, Dolgoprudny, Moscow Region, 141701, Russian Federation
^eProkhorov General Physics Institute of the Russian Academy of Sciences, ul. Vavilova 38, Moscow, 119991, Russian Federation
^fLebedev Physical Institute, Russian Academy of Sciences, Leninsky prosp. 53, Moscow, 119991, Russian Federation

We report on the development of plasma-based sources of extreme ultraviolet radiation for the next generation lithography and mask inspection and the development of equipment for spectral diagnostics of such sources.

Keywords: EUV lithography, laser-produced plasma, radiation sources
PACS: 42.82.Cr, 52.25.Os, 52.59.−f, 52.70.−m, 52.77.−j (all)
DOI: 10.3367/UFNe.2018.06.038447
URL: https://ufn.ru/en/articles/2019/3/j/
Web of Science

000469214700010
Scopus

2-s2.0-85070730766
ADS NASA

2019PhyU...62..304A
Citation: Abramenko D B, Antsiferov P S, Astakhov D I, Vinokhodov A Yu, Vichev I Yu, Gayazov R R, Grushin A S, Dorokhin L A, Ivanov V V, Kim D A, Koshelev K N, Krainov P V, Krivokorytov M S, Krivtsun V M, Lakatosh B V, Lash A A, Medvedev V V, Ryabtsev A N, Sidel’nikov Yu V, Snegirev E P, Solomyannaya A D, Spiridonov M V, Tsygvintsev I P, Yakushev O F, Yakushkin A A "Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection" Phys. Usp. 62 304–314 (2019)

BibTexBibNote ® (generic)BibNote ® (RIS)MedlineRefWorks

@article{Abramenko:2019,
	author = {D. B. Abramenko and P. S. Antsiferov and D. I. Astakhov and A. Yu. Vinokhodov and I. Yu. Vichev and R. R. Gayazov and A. S. Grushin and L. A. Dorokhin and V. V. Ivanov and D. A. Kim and K. N. Koshelev and P. V. Krainov and M. S. Krivokorytov and V. M. Krivtsun and B. V. Lakatosh and A. A. Lash and V. V. Medvedev and A. N. Ryabtsev and Yu. V. Sidel’nikov and E. P. Snegirev and A. D. Solomyannaya and M. V. Spiridonov and I. P. Tsygvintsev and O. F. Yakushev and A. A. Yakushkin},
	title = {Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection},
	publisher = {Physics-Uspekhi},
	year = {2019},
	journal = {Phys. Usp.},
	volume = {62},
	number = {3},
	pages = {304-314},
	url = {https://ufn.ru/en/articles/2019/3/j/},
	doi = {10.3367/UFNe.2018.06.038447}
}

Received: 28th, August 2018, accepted: 20th, June 2018

Оригинал: Абраменко Д Б, Анциферов П С, Астахов Д И, Виноходов А Ю, Вичев И Ю, Гаязов Р Р, Грушин А С, Дорохин Л А, Иванов В В, Ким Д А, Кошелев К Н, Крайнов П В, Кривокорытов М С, Кривцун В М, Лакатош Б В, Лаш А А, Медведев В В, Рябцев А Н, Сидельников Ю В, Снегирёв Е П, Соломянная А Д, Спиридонов М В, Цыгвинцев И П, Якушев О Ф, Якушкин А А «Плазменные источники экстремального ультрафиолетового излучения для литографии и сопутствующих технологических процессов (к 50-летию Института спектроскопии РАН)» УФН 189 323–334 (2019); DOI: 10.3367/UFNr.2018.06.038447