Issue 4, 2024

Anna Dmitrievna Solomyannaya

M.V. Keldysh Institute of Applied Mathematics, Russian Academy of Sciences
Address: Miusskaya pl. 4, Moscow, 125047, Russian Federation

Articles

D.B. Abramenko, P.S. Antsiferov, D.I. Astakhov et al “Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection” 62 304–314 (2019)

See also: I.Yu. Vichev, I.P. Tsygvintsev, A.S. Grushin, D.A. Kim, D.B. Abramenko, A.A. Lash, A.A. Yakushkin, O.F. Yakushev, M.V. Spiridonov, E.P. Snegirev, Yu.V. Sidel’nikov, A.N. Ryabtsev, V.V. Medvedev, M.S. Krivokorytov, B.V. Lakatosh

PACS: 42.82.Cr, 52.25.Os, 52.59.-f, 52.70.-m, 52.77.-j

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