We report on the development of plasma-based sources of extreme ultraviolet radiation for the next generation lithography and mask inspection and the development of equipment for spectral diagnostics of such sources.
Keywords: EUV lithography, laser-produced plasma, radiation sources PACS:42.82.Cr, 52.25.Os, 52.59.−f, 52.70.−m, 52.77.−j (all) DOI:10.3367/UFNe.2018.06.038447 URL: https://ufn.ru/en/articles/2019/3/j/ 000469214700010 2-s2.0-85070730766 2019PhyU...62..304A Citation: Abramenko D B, Antsiferov P S, Astakhov D I, Vinokhodov A Yu, Vichev I Yu, Gayazov R R, Grushin A S, Dorokhin L A, Ivanov V V, Kim D A, Koshelev K N, Krainov P V, Krivokorytov M S, Krivtsun V M, Lakatosh B V, Lash A A, Medvedev V V, Ryabtsev A N, Sidel’nikov Yu V, Snegirev E P, Solomyannaya A D, Spiridonov M V, Tsygvintsev I P, Yakushev O F, Yakushkin A A "Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection" Phys. Usp.62 304–314 (2019)
TY JOUR
TI Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection
AU Abramenko, D. B.
AU Antsiferov, P. S.
AU Astakhov, D. I.
AU Vinokhodov, A. Yu.
AU Vichev, I. Yu.
AU Gayazov, R. R.
AU Grushin, A. S.
AU Dorokhin, L. A.
AU Ivanov, V. V.
AU Kim, D. A.
AU Koshelev, K. N.
AU Krainov, P. V.
AU Krivokorytov, M. S.
AU Krivtsun, V. M.
AU Lakatosh, B. V.
AU Lash, A. A.
AU Medvedev, V. V.
AU Ryabtsev, A. N.
AU Sidel’nikov, Yu. V.
AU Snegirev, E. P.
AU Solomyannaya, A. D.
AU Spiridonov, M. V.
AU Tsygvintsev, I. P.
AU Yakushev, O. F.
AU Yakushkin, A. A.
PB Physics-Uspekhi
PY 2019
JO Physics-Uspekhi
JF Physics-Uspekhi
JA Phys. Usp.
VL 62
IS 3
SP 304-314
UR https://ufn.ru/en/articles/2019/3/j/
ER https://doi.org/10.3367/UFNe.2018.06.038447
Received: 28th, August 2018, accepted: 20th, June 2018