Articles
- D.B. Abramenko, P.S. Antsiferov, D.I. Astakhov et al “Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection” 62 304–314 (2019)
- E.D. Korop, B.E. Meierovich, Yu.V. Sidel’nikov, S.T. Sukhorukov “Micropinch in a high-current diode” 22 727–741 (1979)
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See also:
S.T. Sukhorukov,
B.E. Meierovich,
E.D. Korop,
D.B. Abramenko,
M.S. Krivokorytov,
P.S. Antsiferov,
E.P. Snegirev,
V.V. Medvedev,
V.M. Krivtsun,
A.N. Ryabtsev,
K.N. Koshelev,
D.I. Astakhov,
V.V. Ivanov,
L.A. Dorokhin,
R.R. Gayazov
PACS: 42.82.Cr, 52.25.Os, 52.59.-f, 52.70.-m, 52.77.-j, 52.55.Ez, 52.25.Ps, 52.25.Lp
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