We report on the development of plasma-based sources of extreme ultraviolet radiation for the next generation lithography and mask inspection and the development of equipment for spectral diagnostics of such sources.
Keywords: EUV lithography, laser-produced plasma, radiation sources PACS:42.82.Cr, 52.25.Os, 52.59.−f, 52.70.−m, 52.77.−j (all) DOI:10.3367/UFNe.2018.06.038447 URL: https://ufn.ru/en/articles/2019/3/j/ 000469214700010 2-s2.0-85070730766 2019PhyU...62..304A Citation: Abramenko D B, Antsiferov P S, Astakhov D I, Vinokhodov A Yu, Vichev I Yu, Gayazov R R, Grushin A S, Dorokhin L A, Ivanov V V, Kim D A, Koshelev K N, Krainov P V, Krivokorytov M S, Krivtsun V M, Lakatosh B V, Lash A A, Medvedev V V, Ryabtsev A N, Sidel’nikov Yu V, Snegirev E P, Solomyannaya A D, Spiridonov M V, Tsygvintsev I P, Yakushev O F, Yakushkin A A "Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection" Phys. Usp.62 304–314 (2019)
%0 Journal Article
%T Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection
%A D. B. Abramenko
%A P. S. Antsiferov
%A D. I. Astakhov
%A A. Yu. Vinokhodov
%A I. Yu. Vichev
%A R. R. Gayazov
%A A. S. Grushin
%A L. A. Dorokhin
%A V. V. Ivanov
%A D. A. Kim
%A K. N. Koshelev
%A P. V. Krainov
%A M. S. Krivokorytov
%A V. M. Krivtsun
%A B. V. Lakatosh
%A A. A. Lash
%A V. V. Medvedev
%A A. N. Ryabtsev
%A Yu. V. Sidel’nikov
%A E. P. Snegirev
%A A. D. Solomyannaya
%A M. V. Spiridonov
%A I. P. Tsygvintsev
%A O. F. Yakushev
%A A. A. Yakushkin
%I Physics-Uspekhi
%D 2019
%J Phys. Usp.
%V 62
%N 3
%P 304-314
%U https://ufn.ru/en/articles/2019/3/j/
%U https://doi.org/10.3367/UFNe.2018.06.038447
Received: 28th, August 2018, accepted: 20th, June 2018