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Issue 4, 2024
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A.A. Yakushkin



EUV Labs, Ltd.
Address: Sirenevy bulvar 1, Troitsk, Moscow, 142191, Russian Federation

Articles

  1. D.B. Abramenko, P.S. Antsiferov, D.I. Astakhov et al “Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection” 62 304–314 (2019)

See also: A.Yu. Vinokhodov, A.A. Lash, D.B. Abramenko, B.V. Lakatosh, P.S. Antsiferov, O.F. Yakushev, I.P. Tsygvintsev, A.D. Solomyannaya, E.P. Snegirev, Yu.V. Sidel’nikov, A.N. Ryabtsev, V.V. Medvedev, M.V. Spiridonov, V.M. Krivtsun, A.S. Grushin

PACS: 42.82.Cr, 52.25.Os, 52.59.-f, 52.70.-m, 52.77.-j
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