Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection
a Institute of Spectroscopy, Russian Academy of Sciences, ul. Fizicheskaya 5, Troitsk, Moscow, 108840, Russian Federation
b EUV Labs, Ltd., Sirenevy bulvar 1, Troitsk, Moscow, 142191, Russian Federation
c M.V. Keldysh Institute of Applied Mathematics, Russian Academy of Sciences, Miusskaya pl. 4, Moscow, 125047, Russian Federation
d Moscow Institute of Physics and Technology (State University), Institutskii per. 9, Dolgoprudnyi, Moscow Region, 141700, Russian Federation
e Prokhorov General Physics Institute of the Russian Academy of Sciences, ul. Vavilova 38, Moscow, 119942, Russian Federation
f Lebedev Physical Institute, Russian Academy of Sciences, Leninsky prosp. 53, Moscow, 119991, Russian Federation
We report on the development of plasma-based sources of extreme ultraviolet radiation for the next generation lithography and mask inspection and the development of equipment for spectral diagnostics of such sources.