Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection

D.B. Abramenko^a, P.S. Antsiferov^a, D.I. Astakhov^a, A.Yu. Vinokhodov^b, I.Yu. Vichev^c, R.R. Gayazov^a, A.S. Grushin^c, L.A. Dorokhin^a, V.V. Ivanov^a, D.A. Kim^c, K.N. Koshelev^a, P.V. Krainov^d, M.S. Krivokorytov^a, V.M. Krivtsun^a, B.V. Lakatosh^d, A.A. Lash^b, V.V. Medvedev^a, A.N. Ryabtsev^a, Yu.V. Sidel’nikov^a, E.P. Snegirev^a, A.D. Solomyannaya^c, M.V. Spiridonov^e, f, I.P. Tsygvintsev^c, O.F. Yakushev^f, A.A. Yakushkin^b
^aInstitute of Spectroscopy, Russian Academy of Sciences, ul. Fizicheskaya 5, Troitsk, Moscow, 108840, Russian Federation
^bEUV Labs, Ltd., Sirenevy bulvar 1, Troitsk, Moscow, 142191, Russian Federation
^cM.V. Keldysh Institute of Applied Mathematics, Russian Academy of Sciences, Miusskaya pl. 4, Moscow, 125047, Russian Federation
^dMoscow Institute of Physics and Technology (National Research University), Institutskii per. 9, Dolgoprudny, Moscow Region, 141701, Russian Federation
^eProkhorov General Physics Institute of the Russian Academy of Sciences, ul. Vavilova 38, Moscow, 119991, Russian Federation
^fLebedev Physical Institute, Russian Academy of Sciences, Leninsky prosp. 53, Moscow, 119991, Russian Federation

We report on the development of plasma-based sources of extreme ultraviolet radiation for the next generation lithography and mask inspection and the development of equipment for spectral diagnostics of such sources.

Keywords: EUV lithography, laser-produced plasma, radiation sources
PACS: 42.82.Cr, 52.25.Os, 52.59.−f, 52.70.−m, 52.77.−j (all)
DOI: 10.3367/UFNe.2018.06.038447
URL: https://ufn.ru/en/articles/2019/3/j/
Web of Science

000469214700010
Scopus

2-s2.0-85070730766
ADS NASA

2019PhyU...62..304A
Citation: Abramenko D B, Antsiferov P S, Astakhov D I, Vinokhodov A Yu, Vichev I Yu, Gayazov R R, Grushin A S, Dorokhin L A, Ivanov V V, Kim D A, Koshelev K N, Krainov P V, Krivokorytov M S, Krivtsun V M, Lakatosh B V, Lash A A, Medvedev V V, Ryabtsev A N, Sidel’nikov Yu V, Snegirev E P, Solomyannaya A D, Spiridonov M V, Tsygvintsev I P, Yakushev O F, Yakushkin A A "Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection" Phys. Usp. 62 304–314 (2019)

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Received: 28th, August 2018, accepted: 20th, June 2018

Оригинал: Абраменко Д Б, Анциферов П С, Астахов Д И, Виноходов А Ю, Вичев И Ю, Гаязов Р Р, Грушин А С, Дорохин Л А, Иванов В В, Ким Д А, Кошелев К Н, Крайнов П В, Кривокорытов М С, Кривцун В М, Лакатош Б В, Лаш А А, Медведев В В, Рябцев А Н, Сидельников Ю В, Снегирёв Е П, Соломянная А Д, Спиридонов М В, Цыгвинцев И П, Якушев О Ф, Якушкин А А «Плазменные источники экстремального ультрафиолетового излучения для литографии и сопутствующих технологических процессов (к 50-летию Института спектроскопии РАН)» УФН 189 323–334 (2019); DOI: 10.3367/UFNr.2018.06.038447