Accepted articles

Conferences and symposia


Beryllium-based multilayer X-ray optics

, , ,
Institute for Physics of Microstructures, Russian Academy of Sciences, ul. Ul'yanova 46, Nizhnii Novgorod, 603950, Russian Federation

The article provides a review of the current state of affairs in the field of physics and technology of multilayer beryllium-containing mirrors intended for projection lithography and studying the solar corona in the extreme ultraviolet (EUV) range. The methods of synthesis and studying beryllium-containing multilayer mirrors are described. The results of recent studies of the internal structure and reflection coefficients in the EUV range of multilayer mirrors Mo/Be, Mo/Si, Be/Al, and Be/Mg are given. The effect of the Si and Be interlayers on the reflectivity is explained. The directions for further research on beryllium-containing mirrors are discussed.

Text is available here.

Keywords: multilayer X-ray mirror, X-ray projection photolithography, microscopy, astronomy, spectroscopy, reflectometry, magnetron sputtering, nanofilm synthesis, reflectometry, beryllium, reflectance, interlayer
PACS: 07.60.−j, 42.79.−e, 07.85.Fv, 68.35.Ct, 68.47.De, 68.65.Ac, 68.35.Fx, 68.55.A, 81.15.Cd (all)
DOI: 10.3367/UFNe.2019.05.038623
Citation: Polkovnikov V N, Salashchenko N N, Svechnikov M V, Chkhalo N I "Beryllium-based multilayer X-ray optics" Phys. Usp., accepted

22nd, May 2019

Оригинал: Полковников В Н, Салащенко Н Н, Свечников М В, Чхало Н И «Многослойная рентгеновская оптика на основе бериллия» УФН, принята к публикации; DOI: 10.3367/UFNr.2019.05.038623

© 1918–2019 Uspekhi Fizicheskikh Nauk
Email: ufn@ufn.ru Editorial office contacts About the journal Terms and conditions