The article provides a review of the current state of affairs in the field of physics and technology of multilayer beryllium-containing mirrors intended for projection lithography and solar corona studies in the extreme ultraviolet (EUV) range. The methods of synthesizing and studying beryllium-containing multilayer mirrors are described. The results of recent studies of the internal structure and EUV reflection coefficients are given for Mo/Be, Mo/Si, Be/Al, and Be/Mg multilayer mirrors. The effect of the Si and Be interlayers on the reflectivity is explained. The directions for further research on beryllium-containing mirrors are discussed.
@article{Polkovnikov:2020,author = {V. N. Polkovnikov and N. N. Salashchenko and M. V. Svechnikov and N. I. Chkhalo},title = {Beryllium-based multilayer X-ray optics},publisher = {Physics-Uspekhi},year = {2020},journal = {Phys. Usp.},volume = {63},number = {1},pages = {83-95},url = {https://ufn.ru/en/articles/2020/1/g/},doi = {10.3367/UFNe.2019.05.038623}}
Received: 18th, July 2019, accepted: 22nd, May 2019