The article provides a review of the current state of affairs in the field of physics and technology of multilayer beryllium-containing mirrors intended for projection lithography and solar corona studies in the extreme ultraviolet (EUV) range. The methods of synthesizing and studying beryllium-containing multilayer mirrors are described. The results of recent studies of the internal structure and EUV reflection coefficients are given for Mo/Be, Mo/Si, Be/Al, and Be/Mg multilayer mirrors. The effect of the Si and Be interlayers on the reflectivity is explained. The directions for further research on beryllium-containing mirrors are discussed.
TY JOUR
TI Beryllium-based multilayer X-ray optics
AU Polkovnikov, V. N.
AU Salashchenko, N. N.
AU Svechnikov, M. V.
AU Chkhalo, N. I.
PB Physics-Uspekhi
PY 2020
JO Physics-Uspekhi
JF Physics-Uspekhi
JA Phys. Usp.
VL 63
IS 1
SP 83-95
UR https://ufn.ru/en/articles/2020/1/g/
ER https://doi.org/10.3367/UFNe.2019.05.038623
Received: 18th, July 2019, accepted: 22nd, May 2019