The article provides a review of the current state of affairs in the field of physics and technology of multilayer beryllium-containing mirrors intended for projection lithography and solar corona studies in the extreme ultraviolet (EUV) range. The methods of synthesizing and studying beryllium-containing multilayer mirrors are described. The results of recent studies of the internal structure and EUV reflection coefficients are given for Mo/Be, Mo/Si, Be/Al, and Be/Mg multilayer mirrors. The effect of the Si and Be interlayers on the reflectivity is explained. The directions for further research on beryllium-containing mirrors are discussed.
Keywords: multilayer X-ray mirror, X-ray projection photolithography, microscopy, astronomy, spectroscopy, reflectometry, magnetron sputtering, nanofilm synthesis, beryllium, reflectance, interlayer PACS:07.60.−j, 07.85.Fv, 42.79.−e, 68.35.Ct, 68.35.Fx, 68.47.De, 68.55.A, 68.65.Ac, 81.15.−z (all) DOI:10.3367/UFNe.2019.05.038623 URL: https://ufn.ru/en/articles/2020/1/g/ Citation: Polkovnikov V N, Salashchenko N N, Svechnikov M V, Chkhalo N I "Beryllium-based multilayer X-ray optics" Phys. Usp.63 83–95 (2020)