The article provides a review of the current state of affairs in the field of physics and technology of multilayer beryllium-containing mirrors intended for projection lithography and solar corona studies in the extreme ultraviolet (EUV) range. The methods of synthesizing and studying beryllium-containing multilayer mirrors are described. The results of recent studies of the internal structure and EUV reflection coefficients are given for Mo/Be, Mo/Si, Be/Al, and Be/Mg multilayer mirrors. The effect of the Si and Be interlayers on the reflectivity is explained. The directions for further research on beryllium-containing mirrors are discussed.
PT Journal Article
TI Beryllium-based multilayer X-ray optics
AU Polkovnikov V N
FAU Polkovnikov VN
AU Salashchenko N N
FAU Salashchenko NN
AU Svechnikov M V
FAU Svechnikov MV
AU Chkhalo N I
FAU Chkhalo NI
DP 10 Jan, 2020
TA Phys. Usp.
VI 63
IP 1
PG 83-95
RX 10.3367/UFNe.2019.05.038623
URL https://ufn.ru/en/articles/2020/1/g/
SO Phys. Usp. 2020 Jan 10;63(1):83-95
Received: 18th, July 2019, accepted: 22nd, May 2019