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Beryllium-based multilayer X-ray optics

, , ,
Institute for Physics of Microstructures, Russian Academy of Sciences, ul. Ul'yanova 46, Nizhnii Novgorod, 603950, Russian Federation

The article provides a review of the current state of affairs in the field of physics and technology of multilayer beryllium-containing mirrors intended for projection lithography and solar corona studies in the extreme ultraviolet (EUV) range. The methods of synthesizing and studying beryllium-containing multilayer mirrors are described. The results of recent studies of the internal structure and EUV reflection coefficients are given for Mo/Be, Mo/Si, Be/Al, and Be/Mg multilayer mirrors. The effect of the Si and Be interlayers on the reflectivity is explained. The directions for further research on beryllium-containing mirrors are discussed.

Fulltext pdf (970 KB)
Fulltext is also available at DOI: 10.3367/UFNe.2019.05.038623
Keywords: multilayer X-ray mirror, X-ray projection photolithography, microscopy, astronomy, spectroscopy, reflectometry, magnetron sputtering, nanofilm synthesis, beryllium, reflectance, interlayer
PACS: 07.60.−j, 07.85.Fv, 42.79.−e, 68.35.Ct, 68.35.Fx, 68.47.De, 68.55.A, 68.65.Ac, 81.15.−z (all)
DOI: 10.3367/UFNe.2019.05.038623
URL: https://ufn.ru/en/articles/2020/1/g/
000537855600007
2-s2.0-85084758667
2020PhyU...63...83P
Citation: Polkovnikov V N, Salashchenko N N, Svechnikov M V, Chkhalo N I "Beryllium-based multilayer X-ray optics" Phys. Usp. 63 83–95 (2020)
BibTexBibNote ® (generic)BibNote ® (RIS)MedlineRefWorks

Received: 18th, July 2019, 22nd, May 2019

Оригинал: Полковников В Н, Салащенко Н Н, Свечников М В, Чхало Н И «Многослойная рентгеновская оптика на основе бериллия» УФН 190 92–106 (2020); DOI: 10.3367/UFNr.2019.05.038623

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