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Instruments and methods of investigation


Gas-dynamic sources of cluster ions for basic and applied research

†  a, ‡  b, c, d,  e,  d,  a
a Lomonosov Moscow State University, Faculty of Physics, Leninskie Gory 1 build. 2, Moscow, 119991, Russian Federation
b Universidade Nova de Lisboa, Campus de Campolide, Lisboa, 1099-085, Portugal
c Ryazan State Radio Engineering University named after V.F. Utkin, Gagarina Street 59/1, Ryazan, 390005, Russian Federation
d Wuhan University, Wuhan, Hubei Province, China
e Novosibirsk State University, ul. Pirogova 2, Novosibirsk, 630090, Russian Federation

State of the art in the development and application of gas cluster ion sources is considered. The mechanisms of neutral cluster formation, the techniques applied to study their flows and regularities of ionization and the principles of mass separation of ion beams are discussed. Design features of some cluster ion beam sources intended for various applied and academic studies are considered. Use of such sources for controlled modification of surface topography, ultra-shallow ion implantation, development of analytical techniques, and stimulation of surface chemical reactions is analyzed.

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Fulltext is also available at DOI: 10.3367/UFNe.2021.06.038994
Keywords: clusters, gas cluster ions, ion sources, supersonic flows, ionization, mass separation, sputtering, self-organization, ion implantation, XPS, SIMS
PACS: 29.25.Ni, 36.40.−c, 41.75.−i, 68.49.Sf (all)
DOI: 10.3367/UFNe.2021.06.038994
URL: https://ufn.ru/en/articles/2022/7/c/
001100230300003
2-s2.0-85122825374
2022PhyU...65..677I
Citation: Ieshkin A E, Tolstoguzov A B, Korobeishchikov N G, Pelenovich V O, Chernysh V S "Gas-dynamic sources of cluster ions for basic and applied research" Phys. Usp. 65 677–705 (2022)
BibTexBibNote ® (generic)BibNote ® (RIS)MedlineRefWorks

Received: 23rd, March 2021, revised: 20th, May 2021, 7th, June 2021

Оригинал: Иешкин А Е, Толстогузов А Б, Коробейщиков Н Г, Пеленович В О, Черныш В С «Газодинамические источники кластерных ионов для решения фундаментальных и прикладных задач» УФН 192 722–753 (2022); DOI: 10.3367/UFNr.2021.06.038994

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