Gas-dynamic sources of cluster ions for basic and applied research

A.E. Ieshkin^†^a, A.B. Tolstoguzov^‡^b, c, d, N.G. Korobeishchikov^e, V.O. Pelenovich^d, V.S. Chernysh^a
^aLomonosov Moscow State University, Faculty of Physics, Leninskie Gory 1 build. 2, Moscow, 119991, Russian Federation
^bUniversidade Nova de Lisboa, Campus de Campolide, Lisboa, 1099-085, Portugal
^cRyazan State Radio Engineering University named after V.F. Utkin, Gagarina Street 59/1, Ryazan, 390005, Russian Federation
^dWuhan University, Wuhan, Hubei Province, China
^eNovosibirsk State University, ul. Pirogova 2, Novosibirsk, 630090, Russian Federation

State of the art in the development and application of gas cluster ion sources is considered. The mechanisms of neutral cluster formation, the techniques applied to study their flows and regularities of ionization and the principles of mass separation of ion beams are discussed. Design features of some cluster ion beam sources intended for various applied and academic studies are considered. Use of such sources for controlled modification of surface topography, ultra-shallow ion implantation, development of analytical techniques, and stimulation of surface chemical reactions is analyzed.

Keywords: clusters, gas cluster ions, ion sources, supersonic flows, ionization, mass separation, sputtering, self-organization, ion implantation, XPS, SIMS
PACS: 29.25.Ni, 36.40.−c, 41.75.−i, 68.49.Sf (all)
DOI: 10.3367/UFNe.2021.06.038994
URL: https://ufn.ru/en/articles/2022/7/c/
Web of Science

001100230300003
Scopus

2-s2.0-85122825374
ADS NASA

2022PhyU...65..677I
Citation: Ieshkin A E, Tolstoguzov A B, Korobeishchikov N G, Pelenovich V O, Chernysh V S "Gas-dynamic sources of cluster ions for basic and applied research" Phys. Usp. 65 677–705 (2022)

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Received: 23rd, March 2021, revised: 20th, May 2021, accepted: 7th, June 2021

Оригинал: Иешкин А Е, Толстогузов А Б, Коробейщиков Н Г, Пеленович В О, Черныш В С «Газодинамические источники кластерных ионов для решения фундаментальных и прикладных задач» УФН 192 722–753 (2022); DOI: 10.3367/UFNr.2021.06.038994

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