Reactive diffusion in multilayer metal/silicon nanostructures

Reactive diffusion in nanomaterials differs widely from that in bulk materials. Reviewed in this paper are the basic models and experimental data on how diffusion and phase transformations occur in multilayer nanosystems as these are being prepared and subsequently thermally annealed. The growth kinetics of amorphous silicide phases in Sc/Si and Mo/Si multilayer periodic systems are studied using the combination of high-resolution transmission electron microscopy and small-angle X-ray diffraction. A model is proposed for silicon diffusion through amorphous silicide that undergoes structural relaxation and crystallization as it grows. Anisotropic diffusion and growth of the silicide phase at adjacent interfaces are studied, and the diffusion parameters are measured for the earliest stages of diffusion annealing.

PACS: 66.30.−h, 68.35.Fx, 68.65.−k (all)
DOI: 10.3367/UFNe.0181.201105c.0491
URL: https://ufn.ru/en/articles/2011/5/c/
Web of Science

000294814900003
Scopus

2-s2.0-80051862417
ADS NASA

2011PhyU...54..473Z
Citation: Zubarev E N "Reactive diffusion in multilayer metal/silicon nanostructures" Phys. Usp. 54 473–498 (2011)

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Received: 24th, June 2010, accepted: 21st, September 2010

Оригинал: Зубарев Е Н «Реакционная диффузия в наноразмерных слоистых системах металл/кремний» УФН 181 491–520 (2011); DOI: 10.3367/UFNr.0181.201105c.0491

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