Issues

 / 

2007

 / 

July

  

Conferences and symposia


Research and development in short-wave radiation sources for new-generation lithography

 a,  b,  c
a Institute of Spectroscopy, Russian Academy of Sciences, ul. Fizicheskaya 5, Troitsk, Moscow, 108840, Russian Federation
b ASML Netherlands B.V., De Run 6501, Veldhoven, 5504, The Netherlands
c Institute for Physics of Microstructures, Russian Academy of Sciences, ul. Ul'yanova 46, Nizhnii Novgorod, 603950, Russian Federation

A scientific session of the Physical Sciences Division of the Russian Academy of Sciences (RAS) was held in the Conference Hall of the P N Lebedev Physical Institute, RAS on 31 January 2007. The following reports were presented at the session:
(1) Koshelev K N (Institute of Spectroscopy, RAS, Troitsk, Moscow region), Banine V E (ASML, Veldhoven, the Netherlands), Salashchenko N N (Institute for the Physics of Microstructures, RAS, Nizhny Novgorod). ’Research and development in short-wave radiation sources for new-genera- tion lithography’;
(2) Balykin V I (Institute of Spectroscopy, RAS, Troitsk, Moscow region). ’Parallel fabrication of nanostructures via atom projection’;
(3) Lozovik Yu E, Popov A M (Institute of Spectroscopy, RAS, Troitsk, Moscow region). ’Properties and nanotechnological applications of nanotubes’.
An abridge version of the reports is given below.

Fulltext is available at IOP
PACS: 01.10.Fv, 42.72.−g, 42.82.Cr (all)
DOI: 10.1070/PU2007v050n07ABEH006321
URL: https://ufn.ru/en/articles/2007/7/f/
Citation: Koshelev K N, Banine V E, Salashchenko N N "Research and development in short-wave radiation sources for new-generation lithography" Phys. Usp. 50 741–744 (2007)
BibTexBibNote ® (generic)BibNote ® (RIS)MedlineRefWorks

Оригинал: Кошелев К Н, Банин В Е, Салащенко Н Н «Работы по созданию источников коротковолнового излучения для нового поколения литографии» УФН 177 777 (2007); DOI: 10.3367/UFNr.0177.200707h.0777

References (6) ↓ Cited by (2) Similar articles (20)

  1. Banine V, Moors R J. Phys. D 37 3207 (2004)
  2. Churilov S S, Ryabtsev A N Phys. Scripta 73 614 (2006)
  3. Koshelev K N, Pereira N R J. Appl. Phys. 69 R21 (1991)
  4. Antsiferov P S et al. J. Phys. D 22 1073 (1989)
  5. Koshelev K N et al. In EUV Sources For Lithography (Ed. V Bakshi) (Bellingham, Wash.: SPIE Press, 2006) p. 175
  6. Borisov V M et al. In EUV Sources For Lithography (Ed. V Bakshi) (Bellingham, Wash.: SPIE Press, 2006) p. 477

© 1918–2020 Uspekhi Fizicheskikh Nauk
Email: ufn@ufn.ru Editorial office contacts About the journal Terms and conditions