Issues

 / 

2007

 / 

July

  

Conferences and symposia


Research and development in short-wave radiation sources for new-generation lithography

 a,  b,  c
a Institute of Spectroscopy, Russian Academy of Sciences, ul. Fizicheskaya 5, Troitsk, Moscow, 108840, Russian Federation
b ASML Netherlands B.V., De Run 6501, Veldhoven, 5504, The Netherlands
c Institute for Physics of Microstructures, Russian Academy of Sciences, ul. Ul'yanova 46, Nizhnii Novgorod, 603950, Russian Federation

A scientific session of the Physical Sciences Division of the Russian Academy of Sciences (RAS) was held in the Conference Hall of the P N Lebedev Physical Institute, RAS on 31 January 2007. The following reports were presented at the session:
(1) Koshelev K N (Institute of Spectroscopy, RAS, Troitsk, Moscow region), Banine V E (ASML, Veldhoven, the Netherlands), Salashchenko N N (Institute for the Physics of Microstructures, RAS, Nizhny Novgorod). ’Research and development in short-wave radiation sources for new-genera- tion lithography’;
(2) Balykin V I (Institute of Spectroscopy, RAS, Troitsk, Moscow region). ’Parallel fabrication of nanostructures via atom projection’;
(3) Lozovik Yu E, Popov A M (Institute of Spectroscopy, RAS, Troitsk, Moscow region). ’Properties and nanotechnological applications of nanotubes’.
An abridge version of the reports is given below.

Fulltext pdf (271 KB)
Fulltext is also available at DOI: 10.1070/PU2007v050n07ABEH006321
PACS: 01.10.Fv, 42.72.−g, 42.82.Cr (all)
DOI: 10.1070/PU2007v050n07ABEH006321
URL: https://ufn.ru/en/articles/2007/7/f/
2-s2.0-35948961904
2007PhyU...50..741K
Citation: Koshelev K N, Banine V E, Salashchenko N N "Research and development in short-wave radiation sources for new-generation lithography" Phys. Usp. 50 741–744 (2007)
BibTexBibNote ® (generic)BibNote ® (RIS)MedlineRefWorks

Оригинал: Кошелев К Н, Банин В Е, Салащенко Н Н «Работы по созданию источников коротковолнового излучения для нового поколения литографии» УФН 177 777 (2007); DOI: 10.3367/UFNr.0177.200707h.0777

References (6) ↓ Cited by (3) Similar articles (20)

  1. Banine V, Moors R J. Phys. D 37 3207 (2004)
  2. Churilov S S, Ryabtsev A N Phys. Scripta 73 614 (2006)
  3. Koshelev K N, Pereira N R J. Appl. Phys. 69 R21 (1991)
  4. Antsiferov P S et al. J. Phys. D 22 1073 (1989)
  5. Koshelev K N et al. In EUV Sources For Lithography (Ed. V Bakshi) (Bellingham, Wash.: SPIE Press, 2006) p. 175
  6. Borisov V M et al. In EUV Sources For Lithography (Ed. V Bakshi) (Bellingham, Wash.: SPIE Press, 2006) p. 477

© 1918–2024 Uspekhi Fizicheskikh Nauk
Email: ufn@ufn.ru Editorial office contacts About the journal Terms and conditions