PACS numbers

42.82.Cr Fabrication techniques; lithography, pattern transfer
  1. D.B. Abramenko, P.S. Antsiferov et alPlasma-based sources of extreme ultraviolet radiation for lithography and mask inspectionPhys. Usp. 62 304–314 (2019)
    42.82.Cr, 52.25.Os, 52.59.−f, 52.70.−m, 52.77.−j (all)
  2. K.B. Fritzler, V.Ya. Prinz “3D printing methods for micro- and nanostructuresPhys. Usp. 62 54–69 (2019)
    32.80.Rm, 42.82.Cr, 61.46.−w, 68.65.−k, 81.20.−n (all)
  3. V.I. Balykin, A.N. Ryabtsev et alOn the 40th anniversary of the Institute of Spectroscopy of the Russian Academy of Sciences (Scientific session of the Physical Sciences Division of the Russian Academy of Sciences, 8 October 2008)Phys. Usp. 52 275–309 (2009)
    03.75.−b, 03.75.Hh, 05.30.Jp, 07.07.−a, 32.30.−r, 32.30.Jc, 33.20.−t, 36.40.−c, 37.20.+j, 42.82.Cr, 61.43.−j, 63.20.−e, 63.50.−x, 67.25.dw, 71.35.Lk, 71.36.+c, 78.30.−j, 78.47.−p, 78.55.−m, 81.07.−b, 87.85.fk, 87.64.−t, 95.30.Ky, 97.10.−q (all)
  4. A.N. Ryabtsev, S.S. Churilov “Spectroscopy of ionized atoms for astrophysics and nanotechnologyPhys. Usp. 52 282–286 (2009)
    32.30.−r, 32.30.Jc, 42.82.Cr, 95.30.Ky, 97.10.−q (all)
  5. K.N. Koshelev, V.E. Banine, N.N. Salashchenko “Research and development in short-wave radiation sources for new-generation lithographyPhys. Usp. 50 741–744 (2007)
    01.10.Fv, 42.72.−g, 42.82.Cr (all)
  6. G.N. Shkerdin “Problems of integrated opticsSov. Phys. Usp. 30 549–550 (1987)
    01.30.Vv, 42.82.Et, 42.82.Cr, 42.82.Gw (all)
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