Low-pressure radio-frequency inductive discharge and possibilities of optimizing inductive plasma sources
E.A. Kral’kina
Lomonosov Moscow State University, Department of Physics, Leninskie Gory 1 build. 2, Moscow, 119991, Russian Federation
Plasma reactors and ion sources whose operation
relies on a low-pressure radio-frequency (RF) inductive discharge have been an important constituent of modern ground and space technologies for several decades already. However,
the steadily toughening and varying requirements of plasma
technologies call for improving the old models of devices and
developing novel prospective models. Of vital importance in the
development of inductive plasma sources is the provision of
conditions whereat the plasma efficiently absorbs the RF
power. In recent years it has become evident that in a low-pressure RF inductive discharge the RF-generator power is
distributed between the active resistance of the external circuit
and the plasma. In the latter case, the power is delivered to the
plasma via two channels: an inductive channel, which exists due
to the current flowing through an inductor or an antenna, and a
capacitive one, which is due to the antenna-plasma capacitive
coupling. RF inductive discharge properties related to the RF-power redistribution between the channels are considered and
the mechanisms of RF-power absorption are analyzed. The
feasibilities of optimizing RF inductive plasma sources are also
discussed.
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