A.A. Shklyaev



Rzhanov Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Sciences
Address: prosp. Akad. Lavrenteva 13, Novosibirsk, 630090, Russian Federation

Quantum-Phase Electronics Center, Department of Applied Physics, The University of Tokyo and Japan Science and Technology Agency, CREST
Address: 7-3-1 Hongo, Tokyo, 113-8656, Japan


Articles

  1. A.A. Shklyaev, M. Ichikawa “Extremely dense arrays of germanium and silicon nanostructuresPhys. Usp. 51 133–161 (2008)
  2. A.A. Shklyaev, M. Ichikawa “Fabrication of germanium and silicon nanostructures using a scanning tunneling microscopePhys. Usp. 49 887–903 (2006)

See also: M. Ichikawa

PACS: 78.55.Ap, 81.07.-b, 81.16.-c, 68.37.Ef, 79.70.+q, 81.16.Ta

© 1918–2024 Uspekhi Fizicheskikh Nauk
Email: ufn@ufn.ru Editorial office contacts About the journal Terms and conditions