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Magnetron plasma and nanotechnology

 a,  b,  c
a Institute for High Temperatures, Joint Institute for High Temperatures, Russian Academy of Sciences, ul. Izhorskaya 13/19, Moscow, 127412, Russian Federation
b Joint Institute for High Temperatures, Russian Academy of Sciences, ul. Izhorskaya 13/19, Moscow, 127412, Russian Federation
c Institute of Physics, University of Greifswald, Greifswald, Germany

Magnetron plasma processes involving metal atoms and clusters are reviewed. The formation of metal atoms near the cathode and their nucleation in а buffer gas flow are discussed. The flow of а buffer gas with metal clusters through а magnetron chamber disturbs the equilibrium between the buffer gas flow and clusters near the exit orifice and is accompanied by cluster attachment to the chamber walls. Cluster charging far off the cathode, the disturbance of equilibrium between the buffer gas flow and cluster drift, and the attachment of charged clusters to the chamber walls — the factors determining the output parameters of the cluster beam escaping the magnetron chamber — are analyzed. Cluster deposition on а solid surface and on dusty plasma particles is considered.

Fulltext pdf (520 KB)
Fulltext is also available at DOI: 10.1070/PU2007v050n05ABEH006138
PACS: 36.40.−c, 52.80.Sm, 61.46.Bc (all)
DOI: 10.1070/PU2007v050n05ABEH006138
URL: https://ufn.ru/en/articles/2007/5/a/
000249374100001
2-s2.0-34548594195
2007PhyU...50..455K
Citation: Kashtanov P V, Smirnov B M, Hippler R "Magnetron plasma and nanotechnology" Phys. Usp. 50 455–488 (2007)
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Оригинал: Каштанов П В, Смирнов Б М, Хипплер Р «Магнетронная плазма и нанотехнология» УФН 177 473–510 (2007); DOI: 10.3367/UFNr.0177.200705a.0473

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