Scanning tunneling microscopy of fullerenes on metal and semiconductor surfaces
R.Z. Bakhtizina,
T. Hashizumeb,
Sh. Wangc,
T. Sakuraic aDepartment of Physical Electronics, Bashkir State University, Ufa, Russian Federation bHitachi Advanced Research Laboratory, Hitachi Ltd., Hatoyama, Saitama, Japan cInstitute for Materials Research, Tohoku University, 2-1-1 Katahira, Sendai, 980-77, Japan
The current state of the ultra-high vacuum scanning tunneling microscopy (STM) of fullerene molecules is reviewed with the use of the authors’ work. We focus our work on absorption and reaction of the C60 and C70 fullerenes, separately or in mixture, with semiconductor [Si(111)-7×7 and Si(100)-2×1] and metal [Cu(111)-1×1 and Ag(111)-1×1] surfaces. By using the STM, the adsorption geometry and the corresponding reconstruction are directly observed on these surfaces, and the intramolecular structures are revealed in high resolution STM images which are analyzed theoretically within the local charge distribution model. Results on the ordered growth of fullerene films on metal and semiconductor surfaces are presented and discussed.
PACS:68.35.Bs, 61.16.Ch, 61.46.+w, 68.65.+g (all) DOI:10.1070/PU1997v040n03ABEH000213 URL: https://ufn.ru/en/articles/1997/3/d/ A1997WU37100005 Citation: Bakhtizin R Z, Hashizume T, Wang Sh, Sakurai T "Scanning tunneling microscopy of fullerenes on metal and semiconductor surfaces" Phys. Usp.40 275–290 (1997)
@article{Bakhtizin:1997,author = {R. Z. Bakhtizin and T. Hashizume and Sh. Wang and T. Sakurai},title = {Scanning tunneling microscopy of fullerenes on metal and semiconductor surfaces},publisher = {Physics-Uspekhi},year = {1997},journal = {Phys. Usp.},volume = {40},number = {3},pages = {275-290},url = {https://ufn.ru/en/articles/1997/3/d/},doi = {10.1070/PU1997v040n03ABEH000213}}