Intercalation by atoms (Cs, K, Ba, Pt, Si, C,...) of a monolayer graphite film deposited on a metal (Ir, Re,...) is reviewed. Atoms with low ionization potential (Cs, K, Ba,...) form a monolayer film of the intercalate under the graphite layer, whereas atoms with high unionization potential (Pt, Si, C,...) form a thick multilayer film. The high intercalation efficiency can be accounted for by weak bonding (physisorption) of the graphite film to the metal. An intercalation mechanism is proposed. The superefficient diffusion of intercalated atoms into metals is discussed.

RT Journal
T1 Intercalation by atoms of a two-dimensional graphite film on a metal
A1 Tontegode,A.Ya.
A1 Rut’kov,E.V.
PB Physics-Uspekhi
PY 1993
FD 10 Nov, 1993
JF Physics-Uspekhi
JO Phys. Usp.
VO 36
IS 11
SP 1053-1067
DO 10.1070/PU1993v036n11ABEH002180
LK https://ufn.ru/en/articles/1993/11/c/