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Катодное пятно вакуумной дуги

Введение. Экспериментальное исследование катодного пятна. Типы катодных пятен и их качественная характеристика. Некоторые методические особенности исследования приэлектродных областей вакуумной дуги. Характер движения катодного пятна. Обратное движение катодного пятна в магнитном поле. Время жизни катодного пятна. Величина тока в пятне. Плотность тока в катодном пятне. Эрозия катодов вакуумных дуг. Эрозия в паровой фазе. Катодные струи пара. Концентрация и температура частиц в катодном пятне. Катодное падение потенциала. Теоретическое описание теплового катодного пятна. Вводная часть. Законы эмиссии. Температура поверхности металлов в пятне. Слой объемного заряда и уравнение полного тока. Баланс энергии на поверхности электрода. Параметры, задаваемые при расчете. Расчет параметров прикатодной плазмы. Цитированная литература.

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English fulltext is available at DOI: 10.1070/PU1978v021n08ABEH005674
PACS: 52.80.Mg, 52.80.Vp (все)
DOI: 10.3367/UFNr.0125.197808c.0665
URL: https://ufn.ru/ru/articles/1978/8/c/
Цитата: Любимов Г А, Раховский В И "Катодное пятно вакуумной дуги" УФН 125 665–706 (1978)
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English citation: Lyubimov G A, Rakhovskii V I “The cathode spot of a vacuum arcSov. Phys. Usp. 21 693–718 (1978); DOI: 10.1070/PU1978v021n08ABEH005674

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  2. Zaleski V G, Volochko A T et al Surf. Engin. Appl.Electrochem. 61 (4) 506 (2025)
  3. Karlina A I, Balanovskiy A E et al Applied Sciences 14 (21) 9774 (2024)
  4. Song M, Zhang H et al Plasma Sources Sci. Technol. 33 (10) 105009 (2024)
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  6. Vasyliev V V, Strel’nitskij V E Problems of Atomic Science and Technology 92 (2023)
  7. Maksimov A D, Azarkevich E I et al Bull. Russ. Acad. Sci. Phys. 87 (S2) S274 (2023)
  8. Shibkov V M, Kornev K N et al Plasma Phys. Rep. 48 (7) 806 (2022)
  9. Davydov S G, Dolgov A N et al J. Phys.: Conf. Ser. 2059 (1) 012006 (2021)
  10. Markov G V, Volochko A T et al Vescì Akademìì navuk Belarusì. Seryâ fizika-tehničnyh navuk 66 (4) 391 (2021)
  11. Muzyukin I L, Mikhailov P S J. Phys.: Conf. Ser. 2064 (1) 012015 (2021)
  12. Bogomaz A A, Pinchuk M E et al J. Phys.: Conf. Ser. 1787 (1) 012058 (2021)
  13. Zhang T, Chang L et al Contributions to Plasma Physics 60 (3) (2020)
  14. Zöhrer S, Golizadeh M et al Plasma Sources Sci. Technol. 29 (2) 025022 (2020)
  15. Balanovsky A E, Gozbenko V E et al IOP Conf. Ser.: Mater. Sci. Eng. 759 (1) 012002 (2020)
  16. Ushakov A V, Karpov I V et al Inorg. Mater. Appl. Res. 11 (4) 757 (2020)
  17. Phan L H, Tashiro Sh et al J. Phys. D: Appl. Phys. 52 (26) 26LT02 (2019)
  18. Tezenas du Montcel Benoit, Chapelle P et al IEEE Trans. Plasma Sci. 47 (5) 2765 (2019)
  19. Smolanov N A J. Phys.: Conf. Ser. 1281 (1) 012078 (2019)
  20. Cherednichenko A V, Zuev S P, Serikov V A IOP Conf. Ser.: Mater. Sci. Eng. 560 (1) 012122 (2019)
  21. Balanovskii A E High Temp 57 (1) 8 (2019)
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  24. Balanovskii A E High Temp 56 (1) 1 (2018)
  25. Ramírez-Ramírez S, Sabogal-Suárez D A et al DYNA 85 (204) 76 (2018)
  26. Smolanov N A J. Phys.: Conf. Ser. 857 012043 (2017)
  27. Panarin V Y, Svavil’ny N Y, Khominich A I Journal of Materials Research and Technology 6 (3) 284 (2017)
  28. Smolanov N A J. Phys.: Conf. Ser. 669 012055 (2016)
  29. Tanaka K, Han L et al Plasma Sources Sci. Technol. 24 (4) 045010 (2015)
  30. Zhirkov I, Petruhins A, Rosen J Surface and Coatings Technology 281 20 (2015)
  31. Petkov N, Bahchedzhiev H, Cholakova T Eur. Phys. J. Appl. Phys. 70 (3) 30801 (2015)
  32. Dutova O, Domarov P, Oschepkova T AMM 792 482 (2015)
  33. Zverev V I, Asiunin V I et al Phys. Scr. T161 014073 (2014)
  34. Imaging Gaseous Detectors and Their Applications 1 (2013) p. 251
  35. Smolanov N A, Pankin N A J. Phys.: Conf. Ser. 479 012012 (2013)
  36. Imaging Gaseous Detectors and Their Applications 1 (2013) p. 161
  37. Chaly A M, Barinov Yu A et al IEEE Trans. Plasma Sci. 41 (8) 1917 (2013)
  38. Mesyats G A IEEE Trans. Plasma Sci. 41 (4) 676 (2013)
  39. Tsventoukh M M, Barengolts S A et al Tech. Phys. Lett. 39 (11) 933 (2013)
  40. Chaly A M, Barinov Yu A et al 2012 25th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV), (2012) p. 349
  41. Bobashev S V, Mende N P et al Tech. Phys. 57 (12) 1637 (2012)
  42. Pashchina A, Chinnov V et al 50th AIAA Aerospace Sciences Meeting including the New Horizons Forum and Aerospace Exposition, (2012)
  43. Sanchette F, Ducros C et al Surface and Coatings Technology 205 (23-24) 5444 (2011)
  44. Ling Ju, Boswell R W et al IEEE Trans. Plasma Sci. 39 (8) 1652 (2011)
  45. Vayner B, Ferguson D, Galofaro J 47th AIAA Aerospace Sciences Meeting including The New Horizons Forum and Aerospace Exposition, (2009)
  46. Korenyugin D G, Martsinovsky A M, Orlov K E Tech. Phys. Lett. 35 (10) 944 (2009)
  47. Proskurovsky D I 2008 23rd International Symposium on Discharges and Electrical Insulation in Vacuum, (2008) p. 1
  48. Anders A Springer Series on Atomic, Optical, and Plasma Physics Vol. Cathodic ArcsThe Physics of Cathode Processes50 Chapter 3 (2008) p. 75
  49. Helmersson U, Lattemann M et al Thin Solid Films 513 (1-2) 1 (2006)
  50. Batrakov A 2006 International Symposium on Discharges and Electrical Insulation in Vacuum, (2006) p. 358
  51. Anders A IEEE Trans. Plasma Sci. 33 (5) 1456 (2005)
  52. Schein J, Keidar M 40th AIAA/ASME/SAE/ASEE Joint Propulsion Conference and Exhibit, (2004)
  53. Chapelle P, El M H et al J Mater Sci 39 (24) 7145 (2004)
  54. Vol. XXIst International Symposium on Discharges and Electrical Insulation in Vacuum, 2004. Proceedings. ISDEIV.Cathodic are spots: Ignition probability as a a fundamental concept to describe spot types, phases, and motionAndre Anders1 (2004) p. 152
  55. Batrakov A, Popov S et al IEEE Trans. Plasma Sci. 31 (5) 817 (2003)
  56. Hantzsche E IEEE Trans. Plasma Sci. 31 (5) 799 (2003)
  57. Markov G V Journal of Engineering Physics and Thermophysics 75 (1) 229 (2002)
  58. Markov G V Journal of Engineering Physics and Thermophysics 75 (5) 1219 (2002)
  59. Pozharov S L J. Phys. D: Appl. Phys. 35 (24) 3207 (2002)
  60. Batrakov A V, Jüttner B J et al Jetp Lett. 75 (2) 76 (2002)
  61. Fedun V I, Bulanchuk O N, Kolyada Yu E 20th International Symposium on Discharges and Electrical Insulation in Vacuum, (2002) p. 607
  62. Benilov M S Plasma Sources Sci. Technol. 11 (3A) A49 (2002)
  63. Bogomaz A A, Budin A V et al Tech. Phys. 47 (1) 26 (2002)
  64. Chapelle P, Bellot J P et al J. Phys. D: Appl. Phys. 35 (2) 137 (2002)
  65. Mesyats G A, Barengol’ts S A Uspekhi Fizicheskikh Nauk 172 (10) 1113 (2002)
  66. Benilov M S IEEE Trans. on Ind. Applicat. 37 (4) 986 (2001)
  67. Shmal’ko Yu F, Solovei V V et al Materials Science 37 (5) 689 (2001)
  68. Vol. Conference Record of the 2000 IEEE Industry Applications Conference. Thirty-Fifth IAS Annual Meeting and World Conference on Industrial Applications of Electrical Energy (Cat. No.00CH37129)Near-electrode phenomena in HID lampsM.S.Benilov5 (2000) p. 3301
  69. Vol. Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)On the role of nonmetal inclusions at the cathode surface in the initiation and self-sustaining of a vacuum dischargeS.A.BarengoltsYu.A.Barengolts1 (2000) p. 60
  70. Vol. Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)Characteristics of pseudospark devices with electrodes containing LaB/sub 6/A.I.KuzmichevV.I.KryzhanovskyD.V.Bochkov1 (2000) p. 343
  71. Vogel N IEEE Trans. Plasma Sci. 27 (4) 864 (1999)
  72. Vol. Proceedings ISDEIV. 18th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.98CH36073)Investigations of vacuum arc cathode spots with high temporal and spatial resolutionM.B.BochkarevA.M.Murzakaev1 (1998) p. 244
  73. Pozharov S L, Mirkarimov A M, Soldatov I V Tech. Phys. 43 (11) 1323 (1998)
  74. Brown I G Annu. Rev. Mater. Sci. 28 (1) 243 (1998)
  75. Benilov M S Phys. Scr. 58 (4) 383 (1998)
  76. Vinogradov P, Dmitriev Yu n, Romanenko V E Electromagnetics 17 (6) 563 (1997)
  77. Rogozin A F, Fontana R P IEEE Trans. Plasma Sci. 25 (4) 680 (1997)
  78. He Zh-Ju, Haug R J. Phys. D: Appl. Phys. 30 (4) 603 (1997)
  79. Vogel N, Skvortsov V A IEEE Trans. Plasma Sci. 25 (4) 553 (1997)
  80. Boxman R L, Goldsmith S, Greenwood A IEEE Trans. Plasma Sci. 25 (6) 1174 (1997)
  81. Vol. Proceedings of 17th International Symposium on Discharges and Electrical Insulation in VacuumReactive gas-controlled arc processA.F.RogozinR.P.Fontana2 (1996) p. 957
  82. Krinberg I A, Lukovnikova M P J. Phys. D: Appl. Phys. 29 (11) 2901 (1996)
  83. Rozhanskij V A, Ushakov A A, Voskobojnikov S P Nucl. Fusion 36 (2) 191 (1996)
  84. Vol. Proceedings of 17th International Symposium on Discharges and Electrical Insulation in VacuumNoise measurements of vacuum arc cathode spot lifetimeM.B.Bochkarev1 (1996) p. 151
  85. Kang G H, Uchida H, Koh E S Surface and Coatings Technology 86-87 421 (1996)
  86. Vol. Proceedings of 17th International Symposium on Discharges and Electrical Insulation in VacuumRussian vacuum circuit breakers for electrical networksA.M.ChalyS.P.ChistjakovV.I.RakhovskyY.P.Romotchkin2 (1996) p. 1051
  87. Vol. Proceedings of 17th International Symposium on Discharges and Electrical Insulation in VacuumRole of the magnetic field in the cathode region during vacuum arc operationV.N.ZhitomirskyB.AltcrkopU.KinrotR.BoxmanS.Goldsmith2 (1996) p. 876
  88. Puchkarev V F Handbook of Vacuum Arc Science and Technology (1996) p. 256
  89. Vol. Proceedings of 17th International Symposium on Discharges and Electrical Insulation in VacuumPlasma parameters within the cathode spot of laser-induced vacuum arcs: experimental and theoretical investigationsN.VogelV.Skvortsov1 (1996) p. 89
  90. Vol. Proceedings of 17th International Symposium on Discharges and Electrical Insulation in VacuumElectron emission at superhigh current densitiesA.F.NastoyashchiiI.N.MorozovN.B.Rodionov2 (1996) p. 774
  91. Bolotov A, Kozyrev A, Korolev Y IEEE Trans. Plasma Sci. 23 (6) 884 (1995)
  92. Hantzsche E, Juttner B, Ziegenhagen G IEEE Trans. Plasma Sci. 23 (1) 55 (1995)
  93. Vorob’ev V S, Goncharova I Yu et al Meas Tech 38 (5) 561 (1995)
  94. Benilov M S, Marotta A J. Phys. D: Appl. Phys. 28 (9) 1869 (1995)
  95. Puchkarev V F, Bochkarev M B J. Phys. D: Appl. Phys. 27 (6) 1214 (1994)
  96. Benilov M S Phys. Rev. E 48 (1) 506 (1993)
  97. Vogel N J. Phys. D: Appl. Phys. 26 (10) 1655 (1993)
  98. Tsuruta K, Yamazaki N IEEE Trans. Plasma Sci. 21 (5) 426 (1993)
  99. Puchkarev V F, Chesnokov S M J. Phys. D: Appl. Phys. 25 (12) 1760 (1992)
  100. Anders A, Anders S et al Journal of Applied Physics 71 (10) 4763 (1992)
  101. Anders A, Anders S et al IEEE Trans. Plasma Sci. 20 (4) 466 (1992)
  102. Luban R B, Verkhovodov P A et al Powder Metall Met Ceram 31 (1) 38 (1992)
  103. Nemirovskii A Z, Puchkarev V F J. Phys. D: Appl. Phys. 25 (5) 798 (1992)
  104. Aksel’rod A Z, Popov E A J Eng Phys Thermophys 62 (1) 94 (1992)
  105. Tsuruta K, Suzuki K, Kunitsu K IEEE Trans. Plasma Sci. 20 (2) 99 (1992)
  106. Dyuzhev G A, Shkol’nik S M J Eng Phys Thermophys 62 (5) 525 (1992)
  107. Anders S, Anders A IEEE Trans. Plasma Sci. 19 (1) 20 (1991)
  108. Vogel N, Juttner B J. Phys. D: Appl. Phys. 24 (6) 922 (1991)
  109. Miller H C IEEE Trans. Elect. Insul. 26 (5) 949 (1991)
  110. Raizer Yu P, Allen J E Gas Discharge Physics Chapter 10 (1991) p. 245
  111. JOHNSON PHILIP C Thin Film Processes (1991) p. 209
  112. Miller H C, Kutzner J Contrib. Plasma Phys. 31 (3) 261 (1991)
  113. Brown I G, Dickinson M R et al J. Mater. Eng. 13 (3) 217 (1991)
  114. Randhawa H Thin Solid Films 196 (2) 329 (1991)
  115. Vyskočil J, Musil J Surface and Coatings Technology 43-44 299 (1990)
  116. Godechot X, Salmeron M B et al MRS Proc. 190 (1990)
  117. Miller H C Gas Discharge Closing Switches Chapter 9 (1990) p. 251
  118. VYSKOČIL J, MUSIL J Metallurgical Coatings and Thin Films 1990 (1990) p. 299
  119. Buttram M T, Sampayan S Gas Discharge Closing Switches Chapter 11 (1990) p. 289
  120. Karpov D, Saksagansky G Contrib. Plasma Phys. 30 (4) 523 (1990)
  121. Mesyats G A, Proskurovsky D I Pulsed Electrical Discharge in Vacuum Chapter 8 (1989) p. 159
  122. Kutzner J, Miller H C IEEE Trans. Plasma Sci. 17 (5) 688 (1989)
  123. Mesyats G A, Proskurovsky D I Pulsed Electrical Discharge in Vacuum Chapter 5 (1989) p. 79
  124. Brown I G, Galvin J E IEEE Trans. Plasma Sci. 17 (5) 679 (1989)
  125. Anders S, Anders A Contrib. Plasma Phys. 29 (4-5) 537 (1989)
  126. Anisimov A G, Bashkatov Yu L, Shvetsov G A J Appl Mech Tech Phys 30 (2) 303 (1989)
  127. Mesyats G A, Proskurovsky D I Pulsed Electrical Discharge in Vacuum Chapter 11 (1989) p. 227
  128. Miller H C Contrib. Plasma Phys. 29 (3) 223 (1989)
  129. Swift P D, McKenzie D R et al Journal of Applied Physics 66 (2) 505 (1989)
  130. Vasil’ev V V, Vojtsenya V S et al Journal of Nuclear Materials 162-164 787 (1989)
  131. Hantzsche E IEEE Trans. Plasma Sci. 17 (5) 657 (1989)
  132. Radic N, Santic B IEEE Trans. Plasma Sci. 17 (5) 683 (1989)
  133. Mesyats G A, Proskurovsky D I Pulsed Electrical Discharge in Vacuum Chapter 2 (1989) p. 5
  134. Rakhovsky V I IEEE Trans. Plasma Sci. 15 (5) 481 (1987)
  135. Hantzsche E Contrib Plasma Phys 27 (4) 293 (1987)
  136. Juttner B IEEE Trans. Plasma Sci. 15 (5) 474 (1987)
  137. Vogel N, Kolacinski Z J. Phys. D: Appl. Phys. 20 (4) 545 (1987)
  138. Wieckert C Contrib Plasma Phys 27 (5) 309 (1987)
  139. Donaldson A, Kristiansen M et al IEEE Trans. Magn. 22 (6) 1441 (1986)
  140. Juttner B J. Phys. D: Appl. Phys. 18 (11) 2221 (1985)
  141. Mesyats G A IEEE Trans. Elect. Insul. EI-20 (4) 729 (1985)
  142. Ivanov V A, Juttner B, Pursch H IEEE Trans. Plasma Sci. 13 (5) 334 (1985)
  143. Uematsu K, Morimoto S, Kuriki K Journal of Spacecraft and Rockets 22 (4) 412 (1985)
  144. Burkhart C, Coffey S et al Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 10-11 792 (1985)
  145. Puchkaryov V F, Proskurovsky D I IEEE Trans. Plasma Sci. 13 (5) 257 (1985)
  146. Rakhovsky V I IEEE Trans. Plasma Sci. 12 (3) 199 (1984)
  147. Djakov B E, Lyubimov G A, Rakhovsky V I IEEE Trans. Plasma Sci. 12 (2) 150 (1984)
  148. Juttner B Plasma Phys. Control. Fusion 26 (1A) 249 (1984)
  149. Porotnikov A A, Rodnevich B B Meas Tech 27 (8) 739 (1984)
  150. Hantzsche E Contrib Plasma Phys 23 (1) 77 (1983)
  151. Meunier J L, Drouet M G IEEE Trans. Plasma Sci. 11 (3) 165 (1983)
  152. Dyuzhev G A, Lyubimov G A, Shkol’Nik S M IEEE Trans. Plasma Sci. 11 (1) 36 (1983)
  153. Kosarev E L, Peskov V D, Podolyak E R Nuclear Instruments and Methods in Physics Research 208 (1-3) 637 (1983)
  154. Miller H C IEEE Trans. Plasma Sci. 11 (2) 76 (1983)
  155. Mesyats G A IEEE Trans. Elect. Insul. EI-18 (3) 218 (1983)
  156. Rakhovskii V I Meas Tech 26 (10) 865 (1983)
  157. Kuriki K, Kunii Y, Shimizu Y AIAA Journal 21 (3) 322 (1983)
  158. Baratov D G, Gordeeva G V et al At Energy 53 (6) 854 (1982)
  159. Hantzsche E Physica B+C 104 (1-2) 3 (1981)
  160. Daalder J E Physica B+C 104 (1-2) 91 (1981)
  161. Lyubimov G A, Rakhovsky V I et al J. Phys. D: Appl. Phys. 13 (9) 1655 (1980)
  162. Bogomolov G D, Peskov V D, Sorokin A A J Appl Spectrosc 33 (2) 822 (1980)
  163. Bushik A I, Jüttner B, Pursch H Contrib Plasma Phys 19 (3) 177 (1979)

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