PACS numbers

42.72.−g Optical sources and standards 42.82.Cr Fabrication techniques; lithography, pattern transfer
  1. D.B. Abramenko, P.S. Antsiferov et alPlasma-based sources of extreme ultraviolet radiation for lithography and mask inspection62 304–314 (2019)
    42.82.Cr, 52.25.Os, 52.59.−f, 52.70.−m, 52.77.−j (all)
  2. K.B. Fritzler, V.Ya. Prinz “3D printing methods for micro- and nanostructures62 54–69 (2019)
    32.80.Rm, 42.82.Cr, 61.46.−w, 68.65.−k, 81.20.−n (all)
  3. V.I. Balykin, A.N. Ryabtsev et alOn the 40th anniversary of the Institute of Spectroscopy of the Russian Academy of Sciences (Scientific session of the Physical Sciences Division of the Russian Academy of Sciences, 8 October 2008)52 275–309 (2009)
    03.75.−b, 03.75.Hh, 05.30.Jp, 07.07.−a, 32.30.−r, 32.30.Jc, 33.20.−t, 36.40.−c, 37.20.+j, 42.82.Cr, 61.43.−j, 63.20.−e, 63.50.−x, 67.25.dw, 71.35.Lk, 71.36.+c, 78.30.−j, 78.47.−p, 78.55.−m, 81.07.−b, 87.85.fk, 87.64.−t, 95.30.Ky, 97.10.−q (all)
  4. A.N. Ryabtsev, S.S. Churilov “Spectroscopy of ionized atoms for astrophysics and nanotechnology52 282–286 (2009)
    32.30.−r, 32.30.Jc, 42.82.Cr, 95.30.Ky, 97.10.−q (all)
  5. K.N. Koshelev, V.E. Banine, N.N. Salashchenko “Research and development in short-wave radiation sources for new-generation lithography50 741–744 (2007)
    01.10.Fv, 42.72.−g, 42.82.Cr (all)
  6. G.N. Shkerdin “Problems of integrated optics30 549–550 (1987)
    01.30.Vv, 42.82.Et, 42.82.Cr, 42.82.Gw (all)
  7. V.B. Braginskii, V.I. Panov “The Equivalence of Inertial and Gravitational Masses14 811–811 (1972)
    06.30.Dr, 07.10.−h, 07.20.−n, 42.72.−g (all)
  8. L.I. Vidro, Yu.P. Basharov, A.E. Kudryashov “Fresnel diffraction by a Round aperture13 826–827 (1971)
    42.55.Lt, 42.25.Fx, 42.79.Ag, 42.79.Bh, 42.72.−g, 85.60.Ha (all)
  9. I.L. Fabelinskii “New optical methods of studying rapid processes14 341–349 (1971)
    42.65.Re, 07.60.−j, 42.60.−v, 42.72.−g, 42.65.Hw, 42.65.Es (all)
  10. P. Paradoksov “Doppler effect in the case of a moving image9 276–277 (1966)
    42.30.Va, 42.79.Bh, 42.72.−g (all)
  11. M.P. Vanyukov, A.A. Mak “High-intensity pulsed light sources1 137–155 (1958)
    52.70.Kz, 42.72.−g, 52.80.Mg, 52.80.Qj, 52.35.Tc (all)
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