Identity of the mechanisms of Weibel and Alfvén-cyclotron plasma instabilities

A.S. Dzarakhokhova^a, N.P. Zaretskii^b, A.V. Maksimychev^a, L.I. Men’shikov^a, b, c, P.L. Menshikov^b
^aMoscow Institute of Physics and Technology (National Research University), Institutskii per. 9, Dolgoprudny, Moscow Region, 141701, Russian Federation
^bNational Research Centre ‘Kurchatov Institute’, pl. akad. Kurchatova 1, Moscow, 123182, Russian Federation
^cGero, 60 Paya Lebar Road # 05-40B Paya Lebar Square, Singapore, 409051, Republic of Singapore

A plasma with an anisotropic velocity distribution of particles in a magnetic field is considered. It is shown that the Weibel instability arises in the reference frame rotating together with the particles, for example, ions. When considered in the immobile reference frame, this instability is known as the Alfvén cyclotron instability.

Keywords: Weibel instability, Alfvén cyclotron instability, filamentation
PACS: 52.35.−g
DOI: 10.3367/UFNe.2020.02.038727
URL: https://ufn.ru/en/articles/2020/6/f/
Web of Science

000563842900006
Scopus

2-s2.0-85092042140
ADS NASA

2020PhyU...63..611D
Citation: Dzarakhokhova A S, Zaretskii N P, Maksimychev A V, Men’shikov L I, Menshikov P L "Identity of the mechanisms of Weibel and Alfvén-cyclotron plasma instabilities" Phys. Usp. 63 611–616 (2020)

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PT Journal Article
TI Identity of the mechanisms of Weibel and Alfvén-cyclotron plasma instabilities
AU Dzarakhokhova A S
FAU Dzarakhokhova AS
AU Zaretskii N P
FAU Zaretskii NP
AU Maksimychev A V
FAU Maksimychev AV
AU Men’shikov L I
FAU Men’shikov LI
AU Menshikov P L
FAU Menshikov PL
DP 10 Jun, 2020
TA Phys. Usp.
VI 63
IP 6
PG 611-616
RX 10.3367/UFNe.2020.02.038727
URL https://ufn.ru/en/articles/2020/6/f/
SO Phys. Usp. 2020 Jun 10;63(6):611-616

Received: 5th, September 2019, revised: 29th, January 2020, accepted: 4th, February 2020

Оригинал: Дзарахохова А С, Зарецкий Н П, Максимычев А В, Меньшиков Л И, Меньшиков П Л «Тождественность механизмов плазменных неустойчивостей Вайбеля и альвеновской циклотронной» УФН 190 658–663 (2020); DOI: 10.3367/UFNr.2020.02.038727