We report on the development of plasma-based sources of extreme ultraviolet radiation for the next generation lithography and mask inspection and the development of equipment for spectral diagnostics of such sources.
Keywords: EUV lithography, laser-produced plasma, radiation sources PACS:42.82.Cr, 52.25.Os, 52.59.−f, 52.70.−m, 52.77.−j (all) DOI:10.3367/UFNe.2018.06.038447 URL: https://ufn.ru/en/articles/2019/3/j/ 000469214700010 2-s2.0-85070730766 2019PhyU...62..304A Citation: Abramenko D B, Antsiferov P S, Astakhov D I, Vinokhodov A Yu, Vichev I Yu, Gayazov R R, Grushin A S, Dorokhin L A, Ivanov V V, Kim D A, Koshelev K N, Krainov P V, Krivokorytov M S, Krivtsun V M, Lakatosh B V, Lash A A, Medvedev V V, Ryabtsev A N, Sidel’nikov Yu V, Snegirev E P, Solomyannaya A D, Spiridonov M V, Tsygvintsev I P, Yakushev O F, Yakushkin A A "Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection" Phys. Usp.62 304–314 (2019)
PT Journal Article
TI Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection
AU Abramenko D B
FAU Abramenko DB
AU Antsiferov P S
FAU Antsiferov PS
AU Astakhov D I
FAU Astakhov DI
AU Vinokhodov A Yu
FAU Vinokhodov AY
AU Vichev I Yu
FAU Vichev IY
AU Gayazov R R
FAU Gayazov RR
AU Grushin A S
FAU Grushin AS
AU Dorokhin L A
FAU Dorokhin LA
AU Ivanov V V
FAU Ivanov VV
AU Kim D A
FAU Kim DA
AU Koshelev K N
FAU Koshelev KN
AU Krainov P V
FAU Krainov PV
AU Krivokorytov M S
FAU Krivokorytov MS
AU Krivtsun V M
FAU Krivtsun VM
AU Lakatosh B V
FAU Lakatosh BV
AU Lash A A
FAU Lash AA
AU Medvedev V V
FAU Medvedev VV
AU Ryabtsev A N
FAU Ryabtsev AN
AU Sidel’nikov Yu V
FAU Sidel’nikov YV
AU Snegirev E P
FAU Snegirev EP
AU Solomyannaya A D
FAU Solomyannaya AD
AU Spiridonov M V
FAU Spiridonov MV
AU Tsygvintsev I P
FAU Tsygvintsev IP
AU Yakushev O F
FAU Yakushev OF
AU Yakushkin A A
FAU Yakushkin AA
DP 10 Mar, 2019
TA Phys. Usp.
VI 62
IP 3
PG 304-314
RX 10.3367/UFNe.2018.06.038447
URL https://ufn.ru/en/articles/2019/3/j/
SO Phys. Usp. 2019 Mar 10;62(3):304-314
Received: 28th, August 2018, accepted: 20th, June 2018